DocumentCode :
756392
Title :
Comment on "Annealing behavior of a proton irradiated Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistors grown by MBE"
Author :
Fan, Long ; Hao, Yue
Author_Institution :
Microelectron. Inst., Xidian Univ., Shaanxi, China
Volume :
50
Issue :
7
fYear :
2003
fDate :
7/1/2003 12:00:00 AM
Firstpage :
1715
Lastpage :
1716
Abstract :
For original paper see S.J.Cai et al., ibid., vol.47, p.304-307 (2000). The paper by Cai et al. is the first article referring to radiation effects of Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistors published in this journal. In the paper, authors made use of the shifts of the decomposed three GaN Raman phonon modes E2 to analyze and explain the irradiation effects on GaN. However, we feel that incorrect assignment has been made to the decomposed E2 peaks in GaN and there are obvious errors in citing literature regarding Raman scattering shift rules that warrant comments.
Keywords :
III-V semiconductors; Raman spectra; aluminium compounds; annealing; gallium compounds; high electron mobility transistors; molecular beam epitaxial growth; phonons; proton effects; Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistor; AlGaN-GaN; E2 phonon mode; MBE growth; Raman scattering; annealing; proton irradiation; Aluminum compounds; Annealing; Epitaxial growth; Gallium compounds; MODFETs; Phonons; Proton radiation effects; Raman scattering;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.814976
Filename :
1217262
Link To Document :
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