Electroplated hard magnetic material and its application in microelectromechanical systems

Author

Su, Yufeng ; Wang, Hong ; Ding, Guifu ; Cui, Feng ; Zhang, Weiping ; Chen, Wenyuan

Author_Institution

Res. Inst. of Micro/Nano Sci. & Technol., Shanghai Jiao Tong Univ., China

Volume

41

Issue

12

fYear

2005

Firstpage

4380

Lastpage

4383

Abstract

We describe the preparation of CoNiMnP-based permanent-magnet material using several sulfate and chloride solutions. We studied eight samples, and all the samples show vertical magnetic anisotropy. Sample8, which was electroplated from a low-concentration chloride solution and under external magnetic field, demonstrates the best magnetic properties with coercivity 2632 Oe, remanence 0.20 T, and maximum magnetic energy 10.185 kJ/m³. An array structure can avoid the stress between the electroplated layer and the seed layer. The electroplated Co_0.8Ni_0.1174Mn_0.0062P_0.0762 permanent magnet has potential for bidirectional actuators in micro-electromechanical systems.

Keywords

cobalt compounds; coercive force; electroplated coatings; magnesium compounds; magnetic anisotropy; microactuators; nickel compounds; permanent magnets; Co_0.8Ni_0.1174Mn_0.0062P_0.0762; bidirectional actuator; coercivity; electroplated hard magnetic material; magnetic anisotropy; magnetic energy; microelectromechanical systems; permanent magnet material; remanence; Coercive force; Magnetic anisotropy; Magnetic fields; Magnetic materials; Magnetic properties; Microelectromechanical systems; Permanent magnets; Perpendicular magnetic anisotropy; Remanence; Stress; Bidirectional actuator; electroplated; micro-electromechanical systems (MEMS); permanent magnet;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2005.855644

Filename

1556707