DocumentCode
758764
Title
Scaling effects on gate leakage current
Author
Watanabe, Hiroshi ; Matsuzawa, Kazuya ; Takagi, Shin-ichi
Author_Institution
Adv. LSI Technol. Lab., Toshiba Corp., Yokohama, Japan
Volume
50
Issue
8
fYear
2003
Firstpage
1779
Lastpage
1784
Abstract
Scaling effects on direct tunneling gate leakage current are analyzed by utilizing new models implemented to perform self-consistent calculation between the direct tunneling, the band-gap narrowing (BGN) and the incomplete impurity ionization. This calculation is indispensable for reproducing the measured gate current-gate voltage characteristics in the device simulation. As a result, it is concluded that the scaling of the gate width cannot suppress the gate leak, even if the specification of the threshold voltage is relaxed in order to shrink the gate width. It is also found that the scaling of the gate length cannot suppress the gate leak unless the vertical field is strong.
Keywords
MOSFET; dielectric thin films; leakage currents; semiconductor device models; tunnelling; MOSFET; band-gap narrowing; device simulation; direct tunneling; gate current-gate voltage characteristics; gate leakage current; incomplete impurity ionization; models; self-consistent calculation; threshold voltage; Current measurement; Gate leakage; Impurities; Ionization; Large scale integration; Leakage current; Photonic band gap; Threshold voltage; Tunneling; Voltage measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2003.815140
Filename
1218671
Link To Document