• DocumentCode
    758764
  • Title

    Scaling effects on gate leakage current

  • Author

    Watanabe, Hiroshi ; Matsuzawa, Kazuya ; Takagi, Shin-ichi

  • Author_Institution
    Adv. LSI Technol. Lab., Toshiba Corp., Yokohama, Japan
  • Volume
    50
  • Issue
    8
  • fYear
    2003
  • Firstpage
    1779
  • Lastpage
    1784
  • Abstract
    Scaling effects on direct tunneling gate leakage current are analyzed by utilizing new models implemented to perform self-consistent calculation between the direct tunneling, the band-gap narrowing (BGN) and the incomplete impurity ionization. This calculation is indispensable for reproducing the measured gate current-gate voltage characteristics in the device simulation. As a result, it is concluded that the scaling of the gate width cannot suppress the gate leak, even if the specification of the threshold voltage is relaxed in order to shrink the gate width. It is also found that the scaling of the gate length cannot suppress the gate leak unless the vertical field is strong.
  • Keywords
    MOSFET; dielectric thin films; leakage currents; semiconductor device models; tunnelling; MOSFET; band-gap narrowing; device simulation; direct tunneling; gate current-gate voltage characteristics; gate leakage current; incomplete impurity ionization; models; self-consistent calculation; threshold voltage; Current measurement; Gate leakage; Impurities; Ionization; Large scale integration; Leakage current; Photonic band gap; Threshold voltage; Tunneling; Voltage measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.815140
  • Filename
    1218671