DocumentCode
759551
Title
6-in diameter InP single crystals grown by the hot-wall LEC method and the mirror wafers
Author
Iwasaki, Koji ; Sato, Kouji ; Aoyama, Koichiro ; Numao, Shinji ; Honma, Itsuro ; Sugano, Susumu ; Hoshina, Takaharu ; Sato, Takayuki
Author_Institution
Electron. Mater. Div., Showa Denko K.K., Saitama, Japan
Volume
16
Issue
3
fYear
2003
Firstpage
360
Lastpage
364
Abstract
6-in diameter Fe-doped semi-insulating InP single crystals have been grown by the hot-wall liquid encapsulated Czochralski method. This method has a quartz inner vessel to stabilize the thermal convection. Temperature gradient and solid-liquid interface shape can be controlled by a multizone heater system. The weight of grown crystal was 18 kg and the full length was 250 mm. The dislocation density was about 1×105 cm-2. The resistivity was more than 1×107 Ωcm and its uniformity was the same as the smaller diameter crystal. The conditions of wafer processing were optimized to improve the wafer flatness. The rolloff and the slope of the wafer surface could be reduced especially by the improvement of the polishing conditions. The typical total thickness variation was 3.3 μm, and it was comparable to the GaAs wafer.
Keywords
III-V semiconductors; crystal growth from melt; dislocation density; indium compounds; iron; polishing; semiconductor device manufacture; semiconductor growth; 1×107 ohmcm; 18 kg; 250 mm; 6 in; Fe-doped semi-insulating InP; InP single crystals; InP:Fe; crystal growth; dislocation density; etch pit density; hot-wall LEC method; liquid encapsulated Czochralski method; local thickness variation; mirror wafers; multizone heater system; quartz inner vessel; solid-liquid interface shape control; temperature gradient control; thermal convection stabilization; total thickness variation; wafer flatness; wafer processing conditions; wafer surface polishing conditions; Conductivity; Crystals; Electromagnetic heating; Furnaces; Gallium arsenide; Indium phosphide; Microwave devices; Mirrors; Shape control; Thermal stresses;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2003.815626
Filename
1219479
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