• DocumentCode
    759551
  • Title

    6-in diameter InP single crystals grown by the hot-wall LEC method and the mirror wafers

  • Author

    Iwasaki, Koji ; Sato, Kouji ; Aoyama, Koichiro ; Numao, Shinji ; Honma, Itsuro ; Sugano, Susumu ; Hoshina, Takaharu ; Sato, Takayuki

  • Author_Institution
    Electron. Mater. Div., Showa Denko K.K., Saitama, Japan
  • Volume
    16
  • Issue
    3
  • fYear
    2003
  • Firstpage
    360
  • Lastpage
    364
  • Abstract
    6-in diameter Fe-doped semi-insulating InP single crystals have been grown by the hot-wall liquid encapsulated Czochralski method. This method has a quartz inner vessel to stabilize the thermal convection. Temperature gradient and solid-liquid interface shape can be controlled by a multizone heater system. The weight of grown crystal was 18 kg and the full length was 250 mm. The dislocation density was about 1×105 cm-2. The resistivity was more than 1×107 Ωcm and its uniformity was the same as the smaller diameter crystal. The conditions of wafer processing were optimized to improve the wafer flatness. The rolloff and the slope of the wafer surface could be reduced especially by the improvement of the polishing conditions. The typical total thickness variation was 3.3 μm, and it was comparable to the GaAs wafer.
  • Keywords
    III-V semiconductors; crystal growth from melt; dislocation density; indium compounds; iron; polishing; semiconductor device manufacture; semiconductor growth; 1×107 ohmcm; 18 kg; 250 mm; 6 in; Fe-doped semi-insulating InP; InP single crystals; InP:Fe; crystal growth; dislocation density; etch pit density; hot-wall LEC method; liquid encapsulated Czochralski method; local thickness variation; mirror wafers; multizone heater system; quartz inner vessel; solid-liquid interface shape control; temperature gradient control; thermal convection stabilization; total thickness variation; wafer flatness; wafer processing conditions; wafer surface polishing conditions; Conductivity; Crystals; Electromagnetic heating; Furnaces; Gallium arsenide; Indium phosphide; Microwave devices; Mirrors; Shape control; Thermal stresses;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2003.815626
  • Filename
    1219479