DocumentCode
760313
Title
Small dimension Bragg reflectors formed by air-isolated GaAs layers
Author
Hummel, S. ; Frateschi, Newton ; Dapkus, P.D.
Volume
27
Issue
7
fYear
1991
fDate
3/28/1991 12:00:00 AM
Firstpage
588
Lastpage
590
Abstract
Demonstrates a process for the fabrication of air-isolated microstructures based upon impurity diffusion disordering and selective etching of multilayer structures. The process is illustrated by the fabrication of 5 and 22 mu m wide Bragg reflectors with reflectivities in excess of 95%.
Keywords
III-V semiconductors; diffusion in solids; distributed Bragg reflector lasers; etching; gallium arsenide; semiconductor junction lasers; 22 micron; 5 micron; Bragg reflectors; air-isolated microstructures; impurity diffusion disordering; multilayer structures; reflectivities; selective etching;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19910371
Filename
100853
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