DocumentCode
76208
Title
Signature Driven Hierarchical Post-Manufacture Tuning of RF Systems for Performance and Power
Author
Banerjee, Aritra ; Chatterjee, Abhijit
Author_Institution
Kilby Labs., Texas Instrum., Dallas, TX, USA
Volume
23
Issue
2
fYear
2015
fDate
Feb. 2015
Firstpage
342
Lastpage
355
Abstract
Integration of RF circuits in deeply scaled CMOS technologies and severe process variation in those technology nodes result in poor manufacturing yield. A post-manufacture tuning approach for yield improvement of RF systems is developed in this paper that uses hierarchical behavioral models of the RF systems. The proposed method first determines module-level performances from the system-level response (signature) to an applied test using top-down model diagnosis. Then, constrained optimization is performed to determine the best module-level tuning parameter values that satisfy system-level specifications (bottom-up analysis) in a power-conscious manner. Both top-down and bottom-up analysis techniques are supported by hierarchical RF behavioral models. The relationship between module-level tuning parameters and module-level performance metrics changes from instance to instance depending on amount of process variation and this factor is included in the proposed tuning procedure. A key benefit of the proposed approach is that only a single-test application is needed at a fixed number of tuning knob settings resulting in reduction in tuning time. The efficiency of the proposed technique is demonstrated using simulation results and hardware experiment.
Keywords
CMOS integrated circuits; integrated circuit modelling; integrated circuit yield; radiofrequency integrated circuits; CMOS technology; constrained optimization; manufacturing yield; module level performance metrics; module level performances; module level tuning parameters; radiofrequency circuits; radiofrequency systems; severe process variation; signature driven hierarchical post-manufacture tuning; system level response; system level specifications; top down model diagnosis; yield improvement; Computational modeling; Mathematical model; Mixers; Power demand; Radio frequency; Transmitters; Tuning; Behavioral model; RF; design of experiments (DoE); diagnosis; post-manufacture tuning; response surface methodology (RSM); self-healing; self-healing.;
fLanguage
English
Journal_Title
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher
ieee
ISSN
1063-8210
Type
jour
DOI
10.1109/TVLSI.2014.2309114
Filename
6787106
Link To Document