Title :
Signature Driven Hierarchical Post-Manufacture Tuning of RF Systems for Performance and Power
Author :
Banerjee, Aritra ; Chatterjee, Abhijit
Author_Institution :
Kilby Labs., Texas Instrum., Dallas, TX, USA
Abstract :
Integration of RF circuits in deeply scaled CMOS technologies and severe process variation in those technology nodes result in poor manufacturing yield. A post-manufacture tuning approach for yield improvement of RF systems is developed in this paper that uses hierarchical behavioral models of the RF systems. The proposed method first determines module-level performances from the system-level response (signature) to an applied test using top-down model diagnosis. Then, constrained optimization is performed to determine the best module-level tuning parameter values that satisfy system-level specifications (bottom-up analysis) in a power-conscious manner. Both top-down and bottom-up analysis techniques are supported by hierarchical RF behavioral models. The relationship between module-level tuning parameters and module-level performance metrics changes from instance to instance depending on amount of process variation and this factor is included in the proposed tuning procedure. A key benefit of the proposed approach is that only a single-test application is needed at a fixed number of tuning knob settings resulting in reduction in tuning time. The efficiency of the proposed technique is demonstrated using simulation results and hardware experiment.
Keywords :
CMOS integrated circuits; integrated circuit modelling; integrated circuit yield; radiofrequency integrated circuits; CMOS technology; constrained optimization; manufacturing yield; module level performance metrics; module level performances; module level tuning parameters; radiofrequency circuits; radiofrequency systems; severe process variation; signature driven hierarchical post-manufacture tuning; system level response; system level specifications; top down model diagnosis; yield improvement; Computational modeling; Mathematical model; Mixers; Power demand; Radio frequency; Transmitters; Tuning; Behavioral model; RF; design of experiments (DoE); diagnosis; post-manufacture tuning; response surface methodology (RSM); self-healing; self-healing.;
Journal_Title :
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
DOI :
10.1109/TVLSI.2014.2309114