• DocumentCode
    765311
  • Title

    Ultrasoft and High Magnetic Moment NiFe Film Electrodeposited From a Cu ^2+ Contained Solution

  • Author

    Zong, B.Y. ; Han, G.C. ; Zheng, Y.K. ; Guo, Z.B. ; Li, K.B. ; Wang, L. ; Qiu, J.J. ; Liu, Z.Y. ; An, L.H. ; Luo, P. ; Li, H.L. ; Liu, B.

  • Author_Institution
    Data Storage Inst., Nat. Univ. of Singapore
  • Volume
    42
  • Issue
    10
  • fYear
    2006
  • Firstpage
    2775
  • Lastpage
    2777
  • Abstract
    We report a methodology to fabricate ultrasoft NiFe films via electrodeposition in a sulfate solution. With a little addition of Cu 2+ into the solution, NiFe films become extremely soft: typically, the film coercivities in the hard and easy axes are 0.03 and 0.15 Oe, respectively. The maximum relative permeability is also significantly increased to the order of 1times104. Meanwhile, these achieved ultrasoft NiFe films show a small but finite anisotropic field and high magnetic moments ranging from 1.1 to 1.65 T. These kinds of films can be potentially applied in current and future magnetic recording systems as well as biotechnological and microelectronic devices
  • Keywords
    electrodeposition; magnetic moments; magnetic thin films; nickel compounds; NiFe; biotechnological devices; electrodeposition; film coercivities; finite anisotropic field; high magnetic moment film; magnetic moments; magnetic recording systems; microelectronic devices; sulfate solution; ultrasoft film; Additives; Amorphous magnetic materials; Magnetic field measurement; Magnetic films; Magnetic moments; Magnetostriction; Saturation magnetization; Soft magnetic materials; Superconducting films; Thin film inductors; Cu; NiFe film; high magnetic moment; ultrasoft;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2006.880073
  • Filename
    1704435