DocumentCode
765695
Title
Fabrication of multiple wavelength lasers in GaAs-AlGaAs structures using a one-step spatially controlled quantum-well intermixing technique
Author
Ooi, B.S. ; Ayling, S.G. ; Bryce, A.C. ; Marsh, J.H.
Author_Institution
Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
Volume
7
Issue
9
fYear
1995
Firstpage
944
Lastpage
946
Abstract
We have applied a new technique, based on impurity-free vacancy diffusion, to control the degree of intermixing across a wafer. Bandgap tuned lasers were fabricated using this technique. Five distinguishable lasing wavelengths were observed from five selected intermixed regions on a single chip. These lasers showed no significant change in transparency current, internal quantum efficiency or internal propagation loss, which indicates that the material quality was not degraded after intermixing.<>
Keywords
III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; optical fabrication; optical losses; quantum well lasers; transparency; GaAs-AlGaAs; GaAs-AlGaAs structures; bandgap tuned lasers; fabrication; impurity-free vacancy diffusion; intermixing degree control; internal propagation loss; internal quantum efficiency; lasing wavelengths; material quality; multiple wavelength lasers; one-step spatially controlled quantum-well intermixing technique; single chip; transparency current; wafer; Dielectric materials; Gallium arsenide; Laser tuning; Lithography; Optical device fabrication; Optical materials; Photonic band gap; Quantum well lasers; Thickness control; Waveguide lasers;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.414663
Filename
414663
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