• DocumentCode
    765695
  • Title

    Fabrication of multiple wavelength lasers in GaAs-AlGaAs structures using a one-step spatially controlled quantum-well intermixing technique

  • Author

    Ooi, B.S. ; Ayling, S.G. ; Bryce, A.C. ; Marsh, J.H.

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
  • Volume
    7
  • Issue
    9
  • fYear
    1995
  • Firstpage
    944
  • Lastpage
    946
  • Abstract
    We have applied a new technique, based on impurity-free vacancy diffusion, to control the degree of intermixing across a wafer. Bandgap tuned lasers were fabricated using this technique. Five distinguishable lasing wavelengths were observed from five selected intermixed regions on a single chip. These lasers showed no significant change in transparency current, internal quantum efficiency or internal propagation loss, which indicates that the material quality was not degraded after intermixing.<>
  • Keywords
    III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; optical fabrication; optical losses; quantum well lasers; transparency; GaAs-AlGaAs; GaAs-AlGaAs structures; bandgap tuned lasers; fabrication; impurity-free vacancy diffusion; intermixing degree control; internal propagation loss; internal quantum efficiency; lasing wavelengths; material quality; multiple wavelength lasers; one-step spatially controlled quantum-well intermixing technique; single chip; transparency current; wafer; Dielectric materials; Gallium arsenide; Laser tuning; Lithography; Optical device fabrication; Optical materials; Photonic band gap; Quantum well lasers; Thickness control; Waveguide lasers;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.414663
  • Filename
    414663