• DocumentCode
    766947
  • Title

    Microstructure and Its Growth Mechanism in Sputtered Co-Cr Films

  • Author

    Niimura, Y. ; Naoe, M.

  • Author_Institution
    Tokyo Institute of Technology.
  • Volume
    1
  • Issue
    8
  • fYear
    1985
  • Firstpage
    954
  • Lastpage
    955
  • Abstract
    The two facing targets sputtering technique is used to fabricate Co-Cr films in order to investigate the relations between the microstructure and Cr segregation and the variation in magnetic properties by analyzing the growth mechanism. It was found that the samples formed under high PAr had Hc¿ and Hcu values 30-50 percent higher than films formed in the medium PAr range (0.4-10 mTorr). This seems to be due to the fact that the individual columnar particles forming these films are magnetically isolated and independent.
  • Keywords
    Chromium; Glass; Magnetic films; Magnetic properties; Magnetics Society; Microstructure; Polyimides; Semiconductor films; Sputtering; Tellurium;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1985.4549026
  • Filename
    4549026
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=766947