A Single Etch-Step Fabrication-Tolerant Polarization Splitter

Author

Augustin, Luc M. ; Van der Tol, Jos J G M ; Hanfoug, Rabah ; De Laat, Wim J M ; Van de Moosdijk, Michael J E ; Van Dijk, Paul W L ; Oei, Yok-Siang ; Smit, Meint K.

Author_Institution

Eindhoven Univ. of Technol.

Volume

25

Issue

3

fYear

2007

fDate

3/1/2007 12:00:00 AM

Firstpage

740

Lastpage

746

Abstract

A tolerant single etch-step passive polarization splitter on InP/InGaAsP is designed and fabricated. The device consists of a directional coupler with a wide and a narrow waveguide. Modal birefringence of the third-order modes for transverse electric (TE) and transverse magnetic (TM) polarizations is employed to selectively couple one polarization. Tapering is applied to increase the tolerances. The devices are characterized, and the measurement results show good agreement with the beam-propagation-method simulations: a splitting ratio larger than 95% for a width range of around 100 nm and over a large wavelength range, covering at least the C-band

Keywords

III-V semiconductors; etching; gallium arsenide; indium compounds; integrated optics; optical beam splitters; optical design techniques; optical fabrication; optical polarisers; InP-InGaAsP; beam propagation method; directional coupler; etching; modal birefringence; polarization splitter; Birefringence; Couplings; Directional couplers; Etching; Indium phosphide; Interference; Polarization; Propagation constant; Tellurium; Wavelength measurement; Indium phosphide; integrated devices; polarization splitter;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2006.890430

Filename

4147678