DocumentCode
767649
Title
Bidirectional m/m Transfer Gates for 4 Mb Ion-Implanted Bubble Devices
Author
Kato, Y. ; Urai, H.
Author_Institution
Microelectronics Research Labs., NEC Corporation.
Volume
1
Issue
9
fYear
1985
Firstpage
1117
Lastpage
1119
Abstract
Roles of a compensation conductor on m/m gates for 4 Mb ion-implanted contiguous disk bubble devices were described. The C-loop to S-loop distance was adjusted for gate operation improvement. The compensation conductor cancelled unnecessary magnetic fields near the gate and reduced propagation errors of bubbles near the gate conductor. Bias margins for consecutive transfer operations have been improved even for long data pages.
Keywords
Annealing; Conducting materials; Conductors; Garnet films; Magnetic fields; Magnetics Society; Microelectronics; National electric code; Space vector pulse width modulation; Testing;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1985.4549091
Filename
4549091
Link To Document