• DocumentCode
    767649
  • Title

    Bidirectional m/m Transfer Gates for 4 Mb Ion-Implanted Bubble Devices

  • Author

    Kato, Y. ; Urai, H.

  • Author_Institution
    Microelectronics Research Labs., NEC Corporation.
  • Volume
    1
  • Issue
    9
  • fYear
    1985
  • Firstpage
    1117
  • Lastpage
    1119
  • Abstract
    Roles of a compensation conductor on m/m gates for 4 Mb ion-implanted contiguous disk bubble devices were described. The C-loop to S-loop distance was adjusted for gate operation improvement. The compensation conductor cancelled unnecessary magnetic fields near the gate and reduced propagation errors of bubbles near the gate conductor. Bias margins for consecutive transfer operations have been improved even for long data pages.
  • Keywords
    Annealing; Conducting materials; Conductors; Garnet films; Magnetic fields; Magnetics Society; Microelectronics; National electric code; Space vector pulse width modulation; Testing;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1985.4549091
  • Filename
    4549091