Fabrication and characterization of low-loss optical waveguides using a novel photosensitive polyimide

Author

Yurt, N. ; Mune, K. ; Naito, R. ; Fukuoka, T. ; Mochizuki, A. ; Matsumoto, K. ; Meredith, G. ; Peyghambarian, N. ; Jabbour, G.E.

Author_Institution

Opt. Sci. Center, Univ. of Arizona, Tucson, AZ, USA

Volume

23

Issue

3

fYear

2005

fDate

3/1/2005 12:00:00 AM

Firstpage

1291

Lastpage

1294

Abstract

This paper presents simple fabrication of optical waveguides using a novel photosensitive polyimide (PSPI). PSPI has a glass transition temperature (Tg) of 330°C and is directly patterned by ultraviolet (UV) exposure and wet-chemical development, lending itself to low-cost fabrication techniques. The fabricated waveguides possess low optical absorption at 1.3 and 1.5 μm. Single and multimode buried ridge waveguides were made and tested, and a 0.4-dB/cm optical propagation loss is measured at 1.55 μm.

Keywords

light propagation; optical communication equipment; optical fabrication; optical losses; optical polymers; optical testing; optical waveguides; ridge waveguides; ultraviolet lithography; 1.3 mum; 1.5 mum; 1.55 mum; 330 degC; glass transition temperature; multimode buried ridge waveguides; optical absorption; optical propagation loss; optical waveguides; photosensitive polyimide; ultraviolet exposure; wet-chemical development; Electromagnetic wave absorption; Glass; Optical device fabrication; Optical losses; Optical propagation; Optical waveguides; Polyimides; Propagation losses; Temperature; Testing; Optical communications; optical losses; photosensitive materials; polyimide; polymer waveguides;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2005.843492

Filename

1417028