DocumentCode :
768243
Title :
Ion Beam Sputtered Films of Bismuth-Substituted Yttrium Iron Garnet
Author :
Okuda, T. ; Hayashi, K. ; Koshizuka, N.
Author_Institution :
Electrotechnical Laboratory, Sakura-mura, Ibaraki 305.
Volume :
2
Issue :
2
fYear :
1987
Firstpage :
136
Lastpage :
137
Abstract :
Compared with the conventional liquid phase epitaxy method (LPE), ion beam sputtering (IBS) has advantages in heavy doping of Bi ions, since it is an essentially nonthermal equilibrium process. IBS was used to prepare Bi-substituted YIG films. Epitaxial growth along the {111} direction was observed, however, and small amounts of polycrystalline garnet phase were also found. Bi content of the films reached 2.75/(formula unit). Investigation of the dependences of Faraday rotation on Bi content of the films and on the target composition showed that Faraday rotation reached a maximum of -4.3 × 104 deg/cm, as high as that reported for LPE grown films [1]. Slight contamination of the films by the materials of the ion gun, the grids, iris, wall and target holder was detected.
Keywords :
Bismuth; Contamination; Doping; Epitaxial growth; Garnet films; Ion beams; Iris; Iron; Sputtering; Yttrium;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1987.4549350
Filename :
4549350
Link To Document :
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