• DocumentCode
    768468
  • Title

    Fe/Cu Multilayered Thin Films by RF-Magnetron Sputtering Method

  • Author

    Kozono, Y. ; Komuro, M. ; Narishige, S. ; Hanazono, M.

  • Author_Institution
    Hitachi Research Laboratory, Hitachi Ltd.
  • Volume
    2
  • Issue
    2
  • fYear
    1987
  • Firstpage
    183
  • Lastpage
    184
  • Abstract
    This paper reports on research into the relationship between structure and magnetic properties of Fe/Cu multilayered films grown by the sputtering method in which the Fe and Cu in the system did not have a tendency to form solid solutions with respect to one another. Auger electron spectroscopy analysis and transmission electron microscopy observation showed that these films were periodic multilayered structures. As the thickness of a single layer decreased, the coercivity decreased, and single-axis anistropy in the plane was observed clearly.
  • Keywords
    Coercive force; Iron; Magnetic analysis; Magnetic films; Magnetic materials; Magnetic properties; Saturation magnetization; Sputtering; Transmission electron microscopy; X-ray diffraction;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1987.4549370
  • Filename
    4549370