DocumentCode
768468
Title
Fe/Cu Multilayered Thin Films by RF-Magnetron Sputtering Method
Author
Kozono, Y. ; Komuro, M. ; Narishige, S. ; Hanazono, M.
Author_Institution
Hitachi Research Laboratory, Hitachi Ltd.
Volume
2
Issue
2
fYear
1987
Firstpage
183
Lastpage
184
Abstract
This paper reports on research into the relationship between structure and magnetic properties of Fe/Cu multilayered films grown by the sputtering method in which the Fe and Cu in the system did not have a tendency to form solid solutions with respect to one another. Auger electron spectroscopy analysis and transmission electron microscopy observation showed that these films were periodic multilayered structures. As the thickness of a single layer decreased, the coercivity decreased, and single-axis anistropy in the plane was observed clearly.
Keywords
Coercive force; Iron; Magnetic analysis; Magnetic films; Magnetic materials; Magnetic properties; Saturation magnetization; Sputtering; Transmission electron microscopy; X-ray diffraction;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1987.4549370
Filename
4549370
Link To Document