• DocumentCode
    768508
  • Title

    Total-dose radiation-induced degradation of thin film ferroelectric capacitors

  • Author

    Schwank, J.R. ; Nasby, R.D. ; Miller, S.L. ; Rodgers, M.S. ; Dressendorfer, P.V.

  • Author_Institution
    Sandia Nat. Lab., Albuquerque, NM, USA
  • Volume
    37
  • Issue
    6
  • fYear
    1990
  • fDate
    12/1/1990 12:00:00 AM
  • Firstpage
    1703
  • Lastpage
    1712
  • Abstract
    The radiation hardness of thin-film PbZryTi1-y O3 (PZT) ferroelectric capacitors is explored. Ferroelectric capacitors were irradiated using X-ray and Co-60 sources to dose levels up to 16 Mrad(Si). The capacitors were characterized for their memory properties both before and after irradiation. The radiation hardness was process dependent. Three out of four processes resulted in capacitors that showed less than 30% radiation-induced degradation in retained polarization charge and remnant polarization after irradiating to 16 Mrad(Si). On the other hand, one of the processes showed significant radiation-induced degradation in retained polarization charge and remanent polarization at dose levels above 1 Mrad(Si). A model for simulating the observed degradation is developed. The model indicates that the data are consistent with trapping of radiation-induced charge in the ferroelectric material. The radiation hardness levels indicate that ferroelectric devices can be fabricated that can survive radiation exposures well in excess of 10 Mrad(Si)
  • Keywords
    X-ray effects; dielectric polarisation; ferroelectric storage; gamma-ray effects; lead compounds; radiation hardening (electronics); thin film capacitors; 1.6×107 rad; PZT; PbZrO3TiO3; X-ray irradiation; gamma irradiation; memory properties; model; radiation hardness; radiation-induced charge; remnant polarization; retained polarization charge; thin film ferroelectric capacitors; total dose radiation induced degradation; Annealing; Capacitors; Degradation; Fatigue; Ferroelectric devices; Ferroelectric materials; Laboratories; Nonvolatile memory; Polarization; Transistors;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.101180
  • Filename
    101180