Effects of Plasma Exposure on Magnetization of Ion-implanted Bubble Garnet

Exposure to plasma results in an increase in the change in induced anisotropy field ¿Hk of ion-implanted garnet film. In this work, the change in saturation magnetization was also studied. Ne⁺ ions were implanted into (YSmLuCa)3 (GeFe)5 O12 film and then exposed to plasma. Whereas a linear decrease in saturation magnetization 4¿Ms with implantation dose was seen, plasma exposure caused an increase which was also proportional to the dose. The temperature dependence of 4¿Ms indicated that plasma exposure raised the Tc, which had fallen from 246°C to 180°C with implantation, back to 198°C. Occlusion of hydrogen in the plasma may be partially responsible for this behavior.