• DocumentCode
    769604
  • Title

    Magnetic Properties of CoTaZr Amorphous Thin Films

  • Author

    Hayashi, K. ; Hayakawa, M. ; Ochiai, Y. ; Matsuda, H. ; Ishikawa, W. ; Iwasaki, Y. ; Aso, K.

  • Author_Institution
    Sony Corporation Research Center.
  • Volume
    2
  • Issue
    5
  • fYear
    1987
  • fDate
    5/1/1987 12:00:00 AM
  • Firstpage
    444
  • Lastpage
    445
  • Abstract
    The effect of the sputtering conditions on the magnetic properties of CoTaZr amorphous films are studied. Varying the input power from 100 to 700 W can vary the Co concentration by as much as 8 at%, or approximately 5 kG when converted to Bs. Varying the bias voltage or argon gas pressure can have similar effects. The permeability of multilayered samples was still inferior to that of single-layer samples, a phenomenon that the authors intend to investigate further.
  • Keywords
    Amorphous magnetic materials; Amorphous materials; Argon; Electrical resistance measurement; Magnetic films; Magnetic flux; Magnetic properties; Permeability; Sputtering; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1987.4549482
  • Filename
    4549482
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=769604