DocumentCode
769669
Title
Semiconductor lithography for the next millennium
Author
Geppert, L.
Volume
33
Issue
4
fYear
1996
fDate
4/1/1996 12:00:00 AM
Firstpage
33
Lastpage
38
Abstract
Volume production of ICs sporting 0.1-micrometer structures is being predicted for 2007. Manufacturing tools now being developed will feature much shorter wavelengths and elaborate mirrors in place of traditional lenses. Also being honed is proximity X-ray lithography, which has produced a first level of a memory circuit with 0.25-micrometer dimensions
Keywords
X-ray lithography; integrated circuit manufacture; proximity effect (lithography); 0.1-micrometer structures; IC production; manufacturing tools; memory circuit; mirrors; proximity X-ray lithography; semiconductor lithography; volume production; Circuits; Lenses; Mirrors; Production; Semiconductor device manufacture; X-ray lithography;
fLanguage
English
Journal_Title
Spectrum, IEEE
Publisher
ieee
ISSN
0018-9235
Type
jour
DOI
10.1109/6.486632
Filename
486632
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