DocumentCode
771284
Title
Novel HEMT layout: the RoundHEMT
Author
Marso, M. ; Schimpf, K. ; Fox, A. ; van der Hart, A. ; Hardtdegen, H. ; Hollfelder, M. ; Kordos, P. ; Lüth, H.
Author_Institution
Inst. fur Schicht- und Ionentechnik, Forschungszentrum Julich GmbH, Germany
Volume
31
Issue
7
fYear
1995
fDate
3/30/1995 12:00:00 AM
Firstpage
589
Lastpage
591
Abstract
A novel HEMT layout with ringshaped gate is reported. This conception avoids the problems related to mesa etching at the active region and provides additional possibilities for circuit design. The layer structure of the investigated device is based on an Al-free InP/InGaAs material system. Transistors with a gate length of 0.7 μm show an fT of 40 GHz and an fmax of 117 GHz. These values are similar to results obtained with the conventional HEMT design
Keywords
high electron mobility transistors; microwave field effect transistors; 0.7 micron; 117 GHz; 40 GHz; HEMT layout; InP-InGaAs; RoundHEMT; ringshaped gate;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19950367
Filename
381779
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