• DocumentCode
    772810
  • Title

    Rigorous integration of semiconductor process and device simulators

  • Author

    Binder, Thomas ; Hössinger, Andreas ; Selberherr, Siegfried

  • Author_Institution
    Inst. for Microelectron., Tech. Univ. of Vienna, Austria
  • Volume
    22
  • Issue
    9
  • fYear
    2003
  • Firstpage
    1204
  • Lastpage
    1214
  • Abstract
    We deal with problems arising in the coupling of process and device simulators. It is analyzed what kind of data and algorithms such simulations are based on. An overview of existing technology computer-aided design data models is given. A generic object-oriented data model suitable for three-dimensional process and device simulations, the so-called WAFER-STATE-SERVER is presented. By taking advantage of object-oriented abstraction mechanisms, key tasks in the coupling of simulators are relocated from the simulator into the WAFER-STATE-SERVER. The new data model allows an efficient data exchange between existing process and device simulators. It is capable of managing geometries of different dimensions, and handling grids and distributed quantities stored therein. The data model also defines algorithms to perform geometrical operations as they occur in topography simulations. Three process simulators based on the new data model were developed, one of which is presented in this work.
  • Keywords
    data models; object-oriented methods; semiconductor device models; semiconductor process modelling; technology CAD (electronics); abstraction algorithm; object-oriented data model; semiconductor device simulator; semiconductor process simulator; technology computer aided design; three-dimensional simulation; wafer-state-server; Algorithm design and analysis; Analytical models; Computational modeling; Data models; Design automation; Educational institutions; Fabrication; Geometry; Libraries; Object oriented modeling;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.2003.816219
  • Filename
    1225812