DocumentCode :
772863
Title :
Thick Junctions Made with Nuclear Compensated Silicon
Author :
Messier, J. ; Le Coroller, Y. ; Flores, J.Merlo
Author_Institution :
Service d´´Electronique Physique - Centre d´´Etudes Nucl?aires de Saclay (S. et O.) France
Volume :
11
Issue :
3
fYear :
1964
fDate :
6/1/1964 12:00:00 AM
Firstpage :
276
Lastpage :
279
Abstract :
It is known that making detectors with great depletion depth is related to the availability of high resistivity Si, generally obtained by compensation. We have experimented a new compensating technique, based on the production of P-31, in situ, by nuclear transmutation of Si by thermal neutrons. After annealing, very high resistivity Si (200 000 ¿. cm at 300° K) has been obtained by this method. NIP structures with great depletion depth obtained by nuclear compensation are described, as an example of the possibilities of this new technique.
Keywords :
Annealing; Availability; Boron; Charge carrier density; Detectors; Hall effect; Neutrons; Production; Silicon; Thermal conductivity;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1964.4323434
Filename :
4323434
Link To Document :
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