DocumentCode
774816
Title
The binomial test: a simple tool to identify process problems
Author
Kaempf, Ulrich
Author_Institution
Sematech, Austin, TX, USA
Volume
8
Issue
2
fYear
1995
fDate
5/1/1995 12:00:00 AM
Firstpage
160
Lastpage
166
Abstract
The yield distribution of a batch of wafers is an indicator of the type and behavior of defect sources in the manufacturing process. In a stable process, defects generated by these sources are evenly and randomly distributed, repetitive from wafer-to-wafer. The yield distribution of wafers manufactured in such an environment follows the binomial distribution. If, on the other hand, wafers contain defects with systematic patterns that repeat from wafer-to-wafer, the yield distribution tends to be narrower than the binomial distribution. For defect sources that generate systematic wafer-to-wafer variations, the yield distribution widens if compared with the binomial distribution. The binomial distribution can be calculated from the mean yield and the number of dice per wafer. Thus, comparing the actual yield distribution with the corresponding binomial distribution (binomial test) gives the yield improvement engineer a simple first-order indicator of the behavior of defect sources. Since wafer yield data is routinely available from functional production tests, the binomial test can be performed with existing data. This paper describes the principle and use of the binomial test using visual analysis on graphical yield plots of simulated and actual production wafers
Keywords
binomial distribution; integrated circuit manufacture; integrated circuit testing; integrated circuit yield; statistical analysis; wafer-scale integration; binomial distribution; binomial test; defect sources; evenly distributed; manufacturing process; process problems; production wafers; randomly distributed; stable process; systematic wafer-to-wafer variations; wafer-to-wafer repetitive; wafers; yield distribution; Analytical models; Equal opportunities; Manufacturing processes; Performance evaluation; Process control; Production; Random number generation; Semiconductor device modeling; Snow; Testing;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.382280
Filename
382280
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