Numerical simulation of nanoparticle transport during plasma-enhanced chemical vapor deposition

Author

Warthesen, Sarah J. ; Kortshagen, Uwe ; Girshick, Steven L.

Author_Institution

Dept. of Mech. Eng., Univ. of Minnesota, Minneapolis, MN, USA

Volume

33

Issue

2

fYear

2005

fDate

4/1/2005 12:00:00 AM

Firstpage

398

Lastpage

399

Abstract

The transport of nanoparticles is simulated under conditions of plasma-enhanced chemical vapor deposition. A fluid model solves the spatial and periodic variation in plasma properties and a Monte Carlo method is applied to simulate momentum and charge transfer collisions between nanoparticles and surrounding plasma species. Electrostatic trapping and particle deposition are observed and simulation results reveal the motion of individual nanoparticles.

Keywords

Monte Carlo methods; nanoparticles; plasma CVD; plasma collision processes; plasma simulation; plasma transport processes; Monte Carlo method; charge transfer collisions; electrostatic trapping; fluid model; momentum transfer collisions; nanoparticle transport; numerical simulation; particle deposition; plasma periodic variation; plasma spatial variation; plasma-enhanced chemical vapor deposition; Chemical vapor deposition; Electrodes; Nanoparticles; Numerical simulation; Plasma chemistry; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma simulation; Plasma transport processes; Monte Carlo; nanoparticle; plasma-enhanced chemical vapor deposition; thermophoresis;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2005.845321

Filename

1420495