DocumentCode
77892
Title
Physically Based Evaluation of Electron Mobility in Ultrathin-Body Double-Gate Junctionless Transistors
Author
Kangliang Wei ; Lang Zeng ; Juncheng Wang ; Gang Du ; Xiaoyan Liu
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
Volume
35
Issue
8
fYear
2014
fDate
Aug. 2014
Firstpage
817
Lastpage
819
Abstract
In this letter, we presented theoretical results on the low-field electron mobility of ultrathin-body double-gate junctionless transistors. A 1D Poisson-Schrödinger problem perpendicular to the gate is self-consistently solved to get the electron wavefunctions, and the Kubo-Greenwood formula with consideration of phonon, surface roughness, and ionized impurity scattering is employed to evaluate the corresponding mobility components. The dependence of mobility on silicon layer thickness and doping concentration is also investigated.
Keywords
MOSFET; Poisson equation; Schrodinger equation; electron mobility; impurity scattering; semiconductor doping; stochastic processes; surface roughness; 1D Poisson-Schrödinger problem; JLT; Kubo-Greenwood formula; MOSFET; doping concentration; electron wavefunction; ionized impurity scattering; low-field electron mobility; phonon; physically based evaluation; surface roughness; ultrathin-body double-gate junctionless transistor; Doping; Impurities; Rough surfaces; Scattering; Silicon; Surface roughness; Transistors; Ionized impurity scattering; junctionless (JL); mobility; screening; surface roughness; ultrathin; ultrathin.;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2014.2331326
Filename
6847674
Link To Document