• DocumentCode
    77892
  • Title

    Physically Based Evaluation of Electron Mobility in Ultrathin-Body Double-Gate Junctionless Transistors

  • Author

    Kangliang Wei ; Lang Zeng ; Juncheng Wang ; Gang Du ; Xiaoyan Liu

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing, China
  • Volume
    35
  • Issue
    8
  • fYear
    2014
  • fDate
    Aug. 2014
  • Firstpage
    817
  • Lastpage
    819
  • Abstract
    In this letter, we presented theoretical results on the low-field electron mobility of ultrathin-body double-gate junctionless transistors. A 1D Poisson-Schrödinger problem perpendicular to the gate is self-consistently solved to get the electron wavefunctions, and the Kubo-Greenwood formula with consideration of phonon, surface roughness, and ionized impurity scattering is employed to evaluate the corresponding mobility components. The dependence of mobility on silicon layer thickness and doping concentration is also investigated.
  • Keywords
    MOSFET; Poisson equation; Schrodinger equation; electron mobility; impurity scattering; semiconductor doping; stochastic processes; surface roughness; 1D Poisson-Schrödinger problem; JLT; Kubo-Greenwood formula; MOSFET; doping concentration; electron wavefunction; ionized impurity scattering; low-field electron mobility; phonon; physically based evaluation; surface roughness; ultrathin-body double-gate junctionless transistor; Doping; Impurities; Rough surfaces; Scattering; Silicon; Surface roughness; Transistors; Ionized impurity scattering; junctionless (JL); mobility; screening; surface roughness; ultrathin; ultrathin.;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2014.2331326
  • Filename
    6847674