• DocumentCode
    780589
  • Title

    A Capacitorless 1T-DRAM on SOI Based on Dynamic Coupling and Double-Gate Operation

  • Author

    Bawedin, Maryline ; Cristoloveanu, Sorin ; Flandre, Denis

  • Author_Institution
    Dept. of Eng., Univ. of Cambridge, Cambridge
  • Volume
    29
  • Issue
    7
  • fYear
    2008
  • fDate
    7/1/2008 12:00:00 AM
  • Firstpage
    795
  • Lastpage
    798
  • Abstract
    The scaling requirements of conventional DRAMs lead to the recent developments of capacitorless single-transistor (1T) DRAM in SOI technology. We propose a new concept of 1T-DRAM (named MSDRAM), which is simple to fabricate, program, and read. Its basic mechanism is the metastable dip hysteresis effect, which takes advantage of the dynamic coupling between front and back interfaces in SOI transistors. Systematic measurements and simulations show that MSDRAMs are suitable for low-power applications, as they exhibit negligible off-state current and long retention time even for 50-nm devices.
  • Keywords
    DRAM chips; MOSFET; nanotechnology; silicon-on-insulator; MSDRAM; SOI technology; SOI transistors interfaces; capacitorless single-transistor DRAM; double-gate operation; dynamic coupling; metastable dip hysteresis effect; off-state current; size 50 nm; Current measurement; FinFETs; Hysteresis; MOSFET circuits; Metastasis; Random access memory; Semiconductor films; Time measurement; Tunneling; Voltage; 1T-DRAM; Capacitorless; FinFET; SOI; double gate; floating-body; metastable dip (MSD) effect;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2008.2000601
  • Filename
    4558078