DocumentCode
780589
Title
A Capacitorless 1T-DRAM on SOI Based on Dynamic Coupling and Double-Gate Operation
Author
Bawedin, Maryline ; Cristoloveanu, Sorin ; Flandre, Denis
Author_Institution
Dept. of Eng., Univ. of Cambridge, Cambridge
Volume
29
Issue
7
fYear
2008
fDate
7/1/2008 12:00:00 AM
Firstpage
795
Lastpage
798
Abstract
The scaling requirements of conventional DRAMs lead to the recent developments of capacitorless single-transistor (1T) DRAM in SOI technology. We propose a new concept of 1T-DRAM (named MSDRAM), which is simple to fabricate, program, and read. Its basic mechanism is the metastable dip hysteresis effect, which takes advantage of the dynamic coupling between front and back interfaces in SOI transistors. Systematic measurements and simulations show that MSDRAMs are suitable for low-power applications, as they exhibit negligible off-state current and long retention time even for 50-nm devices.
Keywords
DRAM chips; MOSFET; nanotechnology; silicon-on-insulator; MSDRAM; SOI technology; SOI transistors interfaces; capacitorless single-transistor DRAM; double-gate operation; dynamic coupling; metastable dip hysteresis effect; off-state current; size 50 nm; Current measurement; FinFETs; Hysteresis; MOSFET circuits; Metastasis; Random access memory; Semiconductor films; Time measurement; Tunneling; Voltage; 1T-DRAM; Capacitorless; FinFET; SOI; double gate; floating-body; metastable dip (MSD) effect;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2008.2000601
Filename
4558078
Link To Document