• DocumentCode
    781897
  • Title

    Effects of Parasitic Components in High-FrequencyResonant Drivers for SynchronousRectification MOSFETs

  • Author

    Spiazzi, Giorgio ; Mattavelli, Paolo ; Rossetto, Leopoldo

  • Author_Institution
    Dept. of Inf. Eng., Univ. of Padova, Padova
  • Volume
    23
  • Issue
    4
  • fYear
    2008
  • fDate
    7/1/2008 12:00:00 AM
  • Firstpage
    2082
  • Lastpage
    2092
  • Abstract
    Resonant drivers are usually employed for driving synchronous rectifier (SR) metal oxide semiconductor field effect transistors in high-frequency applications mainly because of their ability to supply high total gate charge in a very short time, while maintaining a high efficiency. However, their practical performance are strongly affected by parasitic components, whose effect is enhanced in applications requiring very high switching frequencies. In this paper, the effects of parasitic components in three different nonisolated resonant driver topologies are analyzed by considering their impact on the driver losses and on the SR gate voltage. The analyses and the experimental verifications reported in this paper originally show that, due to the internal parasitic inductance as well as the parasitic output capacitance of the driver switches, some driver topologies, in principle promising optimum performance, are not always the best solution for very high frequency applications. The more performing resonant driver, was also tested on the voltage regulator module working at 1.8 MHz reported in [21].
  • Keywords
    MOSFET; driver circuits; rectifiers; frequency 1.8 MHz; high-frequency resonant drivers; metal oxide semiconductor field effect transistors; parasitic components; synchronous rectification MOSFET; Driver circuits; FETs; MOSFETs; Performance analysis; Rectifiers; Resonance; Strontium; Switching frequency; Topology; Voltage; Synchronous rectifier (SR); voltage regulators modules (VRMs);
  • fLanguage
    English
  • Journal_Title
    Power Electronics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-8993
  • Type

    jour

  • DOI
    10.1109/TPEL.2008.925200
  • Filename
    4558258