DocumentCode :
782162
Title :
Breakdown of Dielectrics Due to Pulsed Electrons
Author :
Rauch, J.E. ; Andrew, A.
Author_Institution :
Lockheed Palo Alto Research Laboratory Palo Alto, California
Volume :
13
Issue :
6
fYear :
1966
Firstpage :
109
Lastpage :
118
Abstract :
Spontaneous dielectric breakdown was studied in methyl methacrylate polymer, Plexiglas, with a Field Emission Corporation Model 705 Febetron. The breakdown plane was influenced by the presence of embedded metal foils. Charge deposition was measured in a stack of thin sheets of Plexiglas and compared favorably with the calculated charge deposition under the condition of no charge buildup. The energy deposition behind samples of Plexiglas showed a reduction with increased sample thickness. An incident charge density of 4.l ?? 10-2 coulombs/M2 was found necessary to cause spontaneous breakdown in samples thicker than the electron range. The time between the deposition of maximum charge and spontaneous dielectric breakdown was 30 to 40 nanoseconds for an 1/8-inch thick sample with 7.4x10-2 coulombs M2 of incident electrons on an 1/4-inch diameter area. When Plexiglas was irradiated to 7.4x10-2 coulombs/M2, 1/16-inch thick samples did not show breakdown whereas 1/10-inch thick samples did show breakdown.
Keywords :
Aluminum; Charge measurement; Current measurement; Dielectric breakdown; Dielectric materials; Dielectric measurements; Electric breakdown; Electrons; Lamination; Polymers;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1996.4324352
Filename :
4324352
Link To Document :
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