DocumentCode :
786508
Title :
Mode-field converting silica-based waveguide by local heat treatment
Author :
Yanagisawa, M. ; Yamada, Y. ; Kobayashi, Masato
Author_Institution :
NTT Opto-electronics Labs., Ibaraki, Japan
Volume :
28
Issue :
21
fYear :
1992
Firstpage :
1958
Lastpage :
1959
Abstract :
A mode-field converting silica-based waveguide was fabricated simply by locally heating the waveguide end. The mode-field diameter changes from 8.0 to 9.6 mu m with a taper length of 4 mm and then the fibre coupling loss decreased to less than 0.1 dB. This technique was successfully applied to a waveguide array.
Keywords :
heat treatment; integrated optics; optical losses; optical waveguides; optical workshop techniques; silicon compounds; 0.1 dB; 8 to 9.6 micron; SiO 2 based optical waveguide; fibre coupling loss; local heat treatment; mode field conversion; mode-field diameter; silica-based waveguide; waveguide array;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19921255
Filename :
170859
Link To Document :
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