• DocumentCode
    786546
  • Title

    Electron Damage Coefficients in P-Type Silicon

  • Author

    Barrett, M.J.

  • Author_Institution
    Exotech Incorporated Washington, D. C.
  • Volume
    14
  • Issue
    6
  • fYear
    1967
  • Firstpage
    82
  • Lastpage
    87
  • Abstract
    Crucible grown p-type silicon, as used for the base of many commercial solar cells, exhibits a damage coefficient under electron bombardment that appears to involve a double defect in each recombination center. The damage coefficient has been fitted to an empirical formula that accounts for silicon resistivity and for energy of the bombarding particles. To apply this formulation to a practical evaluation of solar cell damage in orbit, two complications were considered. The first is the angular distribution of the space radiation incident on the cell. An experiment showed that electron flux, and not current, determines the extent of the damage. The second is the presence of a transparent coverslide over the cell. By the application of Monte Carlo data for the transmission loss and energy degradation of the electrons, modifications to the damage coefficient can be made to account for coverslide shielding. An exponential attenuation appears adequate to describe these shielding effects. The end product of this study is an analytic formula for the damage coefficient that allows a simple calculation of the damage caused by energetic electrons to n/p silicon solar cells with coverslides.
  • Keywords
    Atomic measurements; Conductivity; Displacement control; Electrons; Impurities; Monte Carlo methods; Neodymium; Photovoltaic cells; Silicon; Spontaneous emission;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1967.4324779
  • Filename
    4324779