DocumentCode :
786897
Title :
Effect of Electron Radiation on Silicon Nitride Insulated Gate Field Effect Transistors
Author :
Newman, Phillip A. ; Wegener, H.A.R.
Author_Institution :
NASA, Goddard Space Flight Center
Volume :
14
Issue :
6
fYear :
1967
Firstpage :
293
Lastpage :
298
Abstract :
Experiments indicate that silicon nitride passivation layers on top of thermally grown oxide in conjunction with heat treatment can improve the radiation stability of MISFET devices. In addition, MOSFET devices that have glass passivation layers and other special treatment can also show improved radiation stability.
Keywords :
Electrons; FETs; Glass; Heat treatment; Insulation; MISFETs; MOSFET circuits; Passivation; Silicon; Thermal stability;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1967.4324809
Filename :
4324809
Link To Document :
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