Effect of ion bombardment and bias fielding for [Ni₈₁Fe ₁₉/Cu] multilayers with giant magnetoresistance deposited by dual ion beam sputtering

Author

Miyamoto, Yasuyoshi ; Yoshitani, Tohru ; Nakagawa, Shigeki ; Naoe, Masahiko

Author_Institution

Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan

Volume

31

Issue

6

fYear

1995

fDate

11/1/1995 12:00:00 AM

Firstpage

4103

Lastpage

4105

Abstract

Ni-Fe/Cu multilayers with giant magnetoresistance (GMR) mere deposited by dual ion beam sputtering method. Simultaneous ion bombardment during the film deposition changed the crystallite orientation in GMR multilayers. The specimen films with ion-bombarded GMR multilayer and unbombarded Fe buffer layer exhibited larger MR ratio and higher field sensitivity ΔMR/ΔH. The films deposited under ion bombardment and bias fielding revealed dominant (100) orientation, and these (100)-oriented films seems to possess relatively better GMR characteristics

Keywords

copper; crystal orientation; ferromagnetic materials; giant magnetoresistance; ion beam effects; iron alloys; magnetic multilayers; magnetoresistance; nickel alloys; sputtered coatings; Ni₈₁Fe₁₉-Cu; [Ni₈₁Fe₁₉/Cu] multilayers; bias fielding; dual ion beam sputtering; giant magnetoresistance; higher field sensitivity; ion bombardment; Buffer layers; Crystallization; Degradation; Iron; Magnetic films; Magnetic multilayers; Nonhomogeneous media; Variable structure systems; Voltage; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.489875

Filename

489875

Effect of ion bombardment and bias fielding for [Ni81Fe 19/Cu] multilayers with giant magnetoresistance deposited by dual ion beam sputtering

Miyamoto, Yasuyoshi ; Yoshitani, Tohru ; Nakagawa, Shigeki ; Naoe, Masahiko

jour

Effect of ion bombardment and bias fielding for [Ni₈₁Fe ₁₉/Cu] multilayers with giant magnetoresistance deposited by dual ion beam sputtering