• DocumentCode
    789952
  • Title

    Schottky diode with cutoff frequency of 400 GHz fabricated in 0.18 μm CMOS

  • Author

    Sankaran, S. ; O, K.K.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainsville, FL, USA
  • Volume
    41
  • Issue
    8
  • fYear
    2005
  • fDate
    4/14/2005 12:00:00 AM
  • Firstpage
    506
  • Lastpage
    508
  • Abstract
    TiSi2-Si Schottky diodes for RF rectification were fabricated using a 0.18 μm CMOS process without any process modifications. These diodes are intended to be used with forward bias and small-signal amplitude. At 0 V bias, the diodes with an area of 0.45×0.45 μm2 achieve a cutoff frequency of over 400 GHz. This is the highest cutoff frequency compared to that for the previously reported Schottky diodes fabricated in foundry CMOS processes. The turn-on voltage of the diodes is ∼0.30 V.
  • Keywords
    CMOS integrated circuits; Schottky diodes; silicon; titanium compounds; 0.18 micron; 0.30 V; 400 GHz; CMOS processes; RF rectification; Schottky diode; TiSi2-Si; cutoff frequency; forward bias operation; small-signal amplitude;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20050282
  • Filename
    1425374