DocumentCode
789952
Title
Schottky diode with cutoff frequency of 400 GHz fabricated in 0.18 μm CMOS
Author
Sankaran, S. ; O, K.K.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainsville, FL, USA
Volume
41
Issue
8
fYear
2005
fDate
4/14/2005 12:00:00 AM
Firstpage
506
Lastpage
508
Abstract
TiSi2-Si Schottky diodes for RF rectification were fabricated using a 0.18 μm CMOS process without any process modifications. These diodes are intended to be used with forward bias and small-signal amplitude. At 0 V bias, the diodes with an area of 0.45×0.45 μm2 achieve a cutoff frequency of over 400 GHz. This is the highest cutoff frequency compared to that for the previously reported Schottky diodes fabricated in foundry CMOS processes. The turn-on voltage of the diodes is ∼0.30 V.
Keywords
CMOS integrated circuits; Schottky diodes; silicon; titanium compounds; 0.18 micron; 0.30 V; 400 GHz; CMOS processes; RF rectification; Schottky diode; TiSi2-Si; cutoff frequency; forward bias operation; small-signal amplitude;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20050282
Filename
1425374
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