DocumentCode
790132
Title
Ferroelectric Thick Film in an Insulator of a Low-Energy Plasma Focus
Author
Sylvester, Gustavo ; Zambra, Marcelo ; Silva, Patricio ; Moreno, José
Author_Institution
Comision Chilena de Energfa Nucl., Santiago
Volume
34
Issue
5
fYear
2006
Firstpage
1934
Lastpage
1937
Abstract
The electric breakdown along the insulator in a plasma focus (PF) device is fundamental for the formation of a homogeneous and symmetric current sheath. From this point of view, the primary electron emission is essential to set the appropriate initial conditions. In this paper, the authors study the effect and viability of an unpolarized ferroelectric lead germanate Pb5Ge3O11 thick film covering the alumina insulator of a 400-J Mather-type PF device on the plasma formation and evolution during the discharge in the PF mode. For over several hundreds of electrical discharges, different insulators covered with the lead-germanate films showed a good mechanical and electric performance. The electrical diagnostic signals are highly reproducible, shot to shot, with a clear definition of the plasma pinch on the axis of discharge
Keywords
discharges (electric); electron emission; ferroelectric materials; lead compounds; pinch effect; plasma diagnostics; plasma focus; plasma sheaths; plasma sources; 400 J; Mather-type plasma focus; Pb5Ge3O11; alumina insulator; electric breakdown; electrical diagnostic signals; electrical discharges; electron emission; ferroelectric lead germanate thick film; homogeneous current sheath; plasma formation; plasma pinch; symmetric current sheath; Dielectrics and electrical insulation; Electric breakdown; Electron emission; Ferroelectric materials; Lead; Plasma devices; Plasma diagnostics; Plasma materials processing; Plasma sheaths; Thick films; Ferroelectric electron emission; ferroelectric insulator; lead germanate; plasma focus (PF);
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2006.876516
Filename
1710061
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