Co-Zn ferrite rigid disks prepared by plasma-free sputtering at low substrate temperature

Author

Matsushita, N. ; Noma, K. ; Nakagawa, S. ; Naoe, M.

Author_Institution

Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan

Volume

31

Issue

6

fYear

1995

fDate

11/1/1995 12:00:00 AM

Firstpage

2779

Lastpage

2781

Abstract

Co-Zn ferrite films deposited at substate temperature T_c below 200°C and above 400°C by using facing targets sputtering apparatus are composed of crystallites with (111) and (311) orientation, respectively. A maximum 4πM_s of 4.8 kG was obtained at T_s of 250°C and then H_c was about 1.5 kOe. The linear recording density of 31 kFRPL was obtained and it is the highest value to be reported for ferrite disk media compared to previous studies using a ring type head

Keywords

cobalt compounds; coercive force; ferrites; hard discs; magnetic hysteresis; magnetic recording; magnetic thin film devices; sputter deposition; zinc compounds; (111) orientation; (311) orientation; 90 to 500 C; Co-Zn ferrite films; Co-Zn ferrite rigid disks; Co_0.51Zn_0.45Fe₂O₄; coercive field; crystallites; facing targets sputtering; hysteresis loops; linear recording density; low substrate temperature; plasma-free sputtering; read/write characteristics; saturation magnetization; Crystallization; Disk recording; Ferrite films; Magnetic films; Magnetic heads; Plasma temperature; Protection; Saturation magnetization; Sputtering; Substrates;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.490149

Filename

490149