Title :
Nanopatterning with interferometric lithography using a compact λ=46.9-nm laser
Author :
Capeluto, Maria G. ; Vaschenko, Georgiy ; Grisham, Michael ; Marconi, Mario C. ; Ludueña, S. ; Pietrasanta, L. ; Lu, Yunfeng ; Parkinson, Bruce ; Menoni, Carmen S. ; Rocca, J.J.
Author_Institution :
Dept. de Fisica, Univ. de Buenos Aires, Argentina
Abstract :
We report the imprinting of nanometer-scale gratings by interferometric lithography at λ=46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd´s mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.
Keywords :
diffraction gratings; gas lasers; light interferometers; nanolithography; nanopatterning; polymers; ultraviolet lithography; 46.9 nm; 55 nm; Lloyds mirror interferometer; Ne-like Ar capillary discharge laser; extreme ultraviolet laser; interferometric lithography; nanometer-scale gratings; nanopatterning; nanotechnology; polymethyl methacrylate; Argon; Coherence; Fault location; Gratings; Interference; Interferometric lithography; Nanopatterning; Nanotechnology; Ultraviolet sources; X-ray lasers; Nanotechnology; X-ray lasers; X-ray lithography; photolithography;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2005.858599
