DocumentCode
793302
Title
Thermal Stability of Compositionally Modulated Amorphous Nitride Alloy Films
Author
Sakakima, H. ; Osano, K.
Author_Institution
Matsushita Electric Industrial Co., Ltd.
Volume
4
Issue
7
fYear
1989
fDate
7/1/1989 12:00:00 AM
Firstpage
428
Lastpage
436
Abstract
Co-based amorphous alloy films composed of non-nitride and nitride layers were prepared by N2 reactive sputtering. The layered films showed soft magnetic properties when the layer thickness was less than 300 Ã
. The saturation magnetization (4¿Ms ) was increased by nitriding. The 4¿Ms of the non-nitride films in the present study was about 7400 G, and that of the layered films was about 8400 G. The layered structure changes into a compositionally modulated structure after annealing above 400°C, and the 4¿Ms of films is thereby increased up to 11,300 G. The resulting compositionally modulated films are thermally stable and were found to have a high crystallization temperature (Tx ≫ 600°C).
Keywords
Amorphous materials; Annealing; Crystallization; Magnetic films; Magnetic properties; Magnetostriction; Saturation magnetization; Sputtering; Temperature; Thermal stability;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1989.4564024
Filename
4564024
Link To Document