DocumentCode :
793714
Title :
Trapping effects in GaN and SiC microwave FETs
Author :
Binari, Steven C. ; Klein, P.B. ; Kazior, Thomas E.
Author_Institution :
Naval Res. Lab., Washington, DC, USA
Volume :
90
Issue :
6
fYear :
2002
fDate :
6/1/2002 12:00:00 AM
Firstpage :
1048
Lastpage :
1058
Abstract :
It is well known that trapping effects can limit the output power performance of microwave field-effect transistors (FETs). This is particularly true for the wide bandgap devices. In this paper we review the various trapping phenomena observed in SiC- and GaN-based FETs that contribute to compromised power performance. For both of these material systems, trapping effects associated with both the surface and with the layers underlying the active channel have been identified. The measurement techniques utilized to identify these traps and some of the steps taken to minimize their effects, such as modified buffer layer designs and surface passivation, are described. Since similar defect-related phenomena were addressed during the development of the GaAs technology, relevant GaAs work is briefly summarized.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; electron traps; gallium compounds; high electron mobility transistors; hole traps; microwave field effect transistors; passivation; semiconductor device measurement; silicon compounds; wide band gap semiconductors; GaN; HEMT; MESFET; SiC; active channel; defect-related phenomena; measurement techniques; microwave FETs; modified buffer layer designs; output power performance; surface passivation; trapping effects; wide bandgap devices; Buffer layers; FETs; Gallium arsenide; Gallium nitride; Measurement techniques; Microwave devices; Passivation; Photonic band gap; Power generation; Silicon carbide;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/JPROC.2002.1021569
Filename :
1021569
Link To Document :
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