DocumentCode :
79391
Title :
Junction Yield Analysis for 10 V Programmable Josephson Voltage Standard Devices
Author :
Fox, Anna E. ; Dresselhaus, Paul D. ; Rufenacht, Alain ; Sanders, Aric ; Benz, Samuel P.
Author_Institution :
Nat. Inst. of Stand. & Technol., Boulder, CO, USA
Volume :
25
Issue :
3
fYear :
2015
fDate :
Jun-15
Firstpage :
1
Lastpage :
5
Abstract :
Analysis of the Josephson junction yield in the National Institute of Standards and Technology 10 V Programmable Josephson Voltage Standard (PJVS) has been performed by fabricating and measuring over 25 million text{Nb/Nb}_math\\rm{x}text{Si}_{1-math\\rm{x}}/text{Nb} junctions. Using the 265 116 junctions per PJVS device, it was possible to measure Shapiro steps on current voltage curves and then estimate the number of single-junction defects within these long arrays. By comparing the results of a quantum-based measurement to a model simulating junction defects, the quantity and magnitude of a small number of junction defects can be estimated from an array of many thousands of junctions. Understanding the source of junction defects in the fabrication process is important for maximizing yield and uniformity, both of which directly relate to the current margin of the quantized voltage step. We have recently fabricated 18 imperfect but usable PJVS devices and 16 that were free from defects, many with n = 1 Shapiro step margins approximately equal to 2 mA. The best of these wafers had a junction defect density of around 3 in a million.
Keywords :
Josephson effect; niobium; niobium alloys; silicon alloys; superconducting arrays; superconducting junction devices; type II superconductors; Josephson junction yield analysis; National Institute of Standards and Technology; Nb-NbxSi1-x-Nb; Shapiro steps; current voltage curves; junction defect density; programmable Josephson voltage standard devices; quantized voltage step; single-junction defects; voltage 10 V; Fabrication; Integrated circuits; Josephson junctions; Junctions; Niobium; Standards; Voltage measurement; Josephson devices; Josephson junctions; Josephson logic; Superconductor-normalsuperconductor devices; superconducting device fabrication; superconducting integrated circuits; superconductor-normal-superconductor devices;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2014.2377744
Filename :
6977912
Link To Document :
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