• DocumentCode
    795258
  • Title

    Spatial correlation of electron field emission sites with non-diamond carbon content in CVD diamond

  • Author

    Humphreys, V.L. ; Khachan, J.

  • Author_Institution
    Dept. of Plasma Phys., Sydney Univ., NSW, Australia
  • Volume
    31
  • Issue
    12
  • fYear
    1995
  • fDate
    6/8/1995 12:00:00 AM
  • Firstpage
    1018
  • Lastpage
    1019
  • Abstract
    Field-induced electron emission is obtained from 15 mm diameter CVD polycrystalline diamond films deposited on silicon wafers from a microwave discharge. These films were grown such that the percentage of non-diamond carbon is highest at the edge of the film. It was found that the majority of the emission sites also occured at the edge of the film
  • Keywords
    CVD coatings; diamond; electron field emission; C; CVD polycrystalline diamond films; electron field emission; microwave discharge; nondiamond carbon content; silicon wafers; spatial correlation;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19950698
  • Filename
    390961