DocumentCode
795625
Title
Magnetic Properties and Crystal Structures of Sputtered CoFe Films
Author
Iwasaki, H.
Author_Institution
Toshiba Corp.
Volume
5
Issue
6
fYear
1990
fDate
6/1/1990 12:00:00 AM
Firstpage
515
Lastpage
521
Abstract
Sputtered Co-(15-19 at%) Fe films were prepared, varying the Ar gas pressure and substrate temperature as parameters. The relationships between the film magnetic properties and crystal structure were investigated. Films with an fcc phase (111) preferred orientation showed relatively high Hc values of more than 8 Oe and a Bs of about 19 kG. Films with a bec phase (110) preferred orientation showed low Hc values of 2 to 3 Oe, comparable to the values for single-layered Fe-base films, and a Bs of about 21 kG. It was verified that this difference in Hc is not attributable to differences in internal stress or in crystallite size.
Keywords
Argon; Iron; Magnetic field measurement; Magnetic films; Magnetic heads; Magnetic properties; Magnetic recording; Sputtering; Substrates; Temperature;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1990.4564303
Filename
4564303
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