Title :
Frequency domain reflectometry of Hitachi ECR plasma-tool
Author :
Law, V.J. ; Macgearailt, N.
Author_Institution :
Nat. Centre for Plasma Sci. & Technol., Dublin City Univ., Ireland
Abstract :
A frequency domain reflectometry measurement technique for fault location and post-maintenance qualification of a production electron cyclotron resonance plasma-tool is described. The technique employs a variable transmission-line length between the bridge and the bias matching network of the tool to tune into a wafer electrode
Keywords :
cyclotron resonance <Hitachi ECR plasma-tool, freq. domain reflectometry>; fault location <Hitachi ECR plasma-tool, freq. domain reflectometry>; frequency-domain analysis <Hitachi ECR plasma-tool, freq. domain reflectometry>; microwave reflectometry <Hitachi ECR plasma-tool, freq. domain reflectometry>; nanotechnology <Hitachi ECR plasma-tool, freq. domain reflectometry>; sputter etching <Hitachi ECR plasma-tool, freq. domain reflectometry>; Hitachi ECR plasma tool; bias matching network; electron cyclotron resonance; fault location; frequency domain reflectometry; post maintenance qualification; reflectometry measurement technique; transmission line; wafer electrode;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20063219
