DocumentCode :
797932
Title :
Anisotropic ECR etching of benzocyclobutene
Author :
Shul, R.J. ; Sullivan, C.T. ; McClellan, G.B.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
Volume :
31
Issue :
22
fYear :
1995
fDate :
10/26/1995 12:00:00 AM
Firstpage :
1919
Lastpage :
1921
Abstract :
Anisotropic, high rate etching of benzocyclobutene (BCB) with smooth surfaces and sidewalls has been achieved in a SF6/O 2/Ar electron cyclotron resonance (ECR)-generated plasma. BCB sidewall profiles, etch rates, and selectivity to photoresist are evaluated against SF6:O2 ratio, pressure, microwave power, and RF power
Keywords :
integrated optics; optical fabrication; optical waveguides; polymer films; sputter etching; Ar; ECR-generated plasma; O2; SF6; SF6-O2-Ar; anisotropic ECR etching; benzocyclobutene; electron cyclotron resonance; etch rates; high rate etching; optical waveguide fabrication; selectivity; sidewall profiles;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19951321
Filename :
490660
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=797932
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