DocumentCode
799010
Title
Digital GaAs FET versus Si FET gate delay as predicted from the electron velocity
Author
Fulkerson, David E.
Author_Institution
Honeywell Syst. & Res. Center, Bloomington, MN, USA
Volume
39
Issue
3
fYear
1992
fDate
3/1/1992 12:00:00 AM
Firstpage
745
Lastpage
748
Abstract
A FET model that takes into account the effective saturation velocity (including the effect of velocity overshoot), fringing capacitance, and source resistance is discussed. The model is applied to identical differential source-coupled FET logic gates in both GaAs and Si. The simulated gate delay of the Si logic gate is about 2.6 times that of the GaAs gate, thus refuting the common hypothesis that GaAs gate, thus refuting the common hypothesis that GaAs and Si delays should be about equal because their equilibrium saturated electron velocities are about equal
Keywords
delays; equivalent circuits; field effect transistors; logic gates; semiconductor device models; DCFL; FET gate delay; FET model; GaAs; HIGFET; Si; differential source-coupled FET logic; digital FET circuits; effective saturation velocity; electron velocity; fringing capacitance; large signal model; logic gate; source resistance; velocity overshoot; Artificial intelligence; Capacitance; Character generation; Delay; Dielectrics; Electron mobility; FETs; Gallium arsenide; Logic gates; Predictive models;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.123507
Filename
123507
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