Nickel-chrome-iron alloy film deposited by pulsed arc deposition

In this paper, a technique for depositing nickel-chrome-iron alloy film using a pulsed arc deposition is introduced. The plating technique has been developed and the properties of the film deposited with the developed technique are measured. The results show that the difference of composition between the film and cathode material is less than ±3% and by adding an collimating electrode, the uniform transmittance can be achieved over a distance 70 mm on the substrate.