DocumentCode
799126
Title
Nickel-chrome-iron alloy film deposited by pulsed arc deposition
Author
Cai, Changlong ; Wang, Jimei ; Yan, Yixin ; Hang, Lingxia ; Zhu, Chang
Author_Institution
Electr. Fac. of Eng., Xi´´an Jiaotong Univ., China
Volume
30
Issue
2
fYear
2002
fDate
4/1/2002 12:00:00 AM
Firstpage
725
Lastpage
727
Abstract
In this paper, a technique for depositing nickel-chrome-iron alloy film using a pulsed arc deposition is introduced. The plating technique has been developed and the properties of the film deposited with the developed technique are measured. The results show that the difference of composition between the film and cathode material is less than ±3% and by adding an collimating electrode, the uniform transmittance can be achieved over a distance 70 mm on the substrate.
Keywords
arcs (electric); chromium alloys; iron alloys; metallic thin films; nickel alloys; plasma deposited coatings; plasma deposition; 70 mm; Ni-Cr-Fe; cathode material; collimating electrode; film; ion plating; nickel-chrome-iron alloy film; plating technique; pulsed arc deposition; transmittance; Anodes; Arc discharges; Cathodes; Coatings; Electrodes; Ignition; Nickel alloys; Optical films; Plasmas; Substrates;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2002.1024275
Filename
1024275
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