DocumentCode
799168
Title
Soft Magnetic Properties of High-Bs FeTa-N-O Films
Author
Oura, H. ; Watanabe, Y. ; Onozato, N.
Author_Institution
JVC.
Volume
6
Issue
11
fYear
1991
Firstpage
960
Lastpage
966
Abstract
Magnetic thin films of FeTa-N-O were prepared by using facing-target type dc magnetron sputtering in Ar+N2 +O2 plasma. The magnetic and structural properties were investigated as a function of the flow rates of the O2 and N2 introduced into the argon atmosphere. A high Bs (19 kG) and soft magnetic properties (Hc ¿0.3 Oe, ¿¿3000) were obtained for a wide range of O2 and N2 flow rates, and were retained after high-temperature (600°C) annealing. X-ray diffraction patterns of ¿-Fe (110) revealed that the soft magnetic films consisted of fine grains. The addition of Ta and N2 together with 02 in small amounts was highly effective for improving the soft magnetic properties and thermal stability. It decreased the post-annealing magnetic anisotropy and prevented the growth of ¿-Fe grains.
Keywords
Annealing; Argon; Atmosphere; Magnetic anisotropy; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Plasma properties; Soft magnetic materials; Sputtering;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1991.4565288
Filename
4565288
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