DocumentCode :
799168
Title :
Soft Magnetic Properties of High-Bs FeTa-N-O Films
Author :
Oura, H. ; Watanabe, Y. ; Onozato, N.
Author_Institution :
JVC.
Volume :
6
Issue :
11
fYear :
1991
Firstpage :
960
Lastpage :
966
Abstract :
Magnetic thin films of FeTa-N-O were prepared by using facing-target type dc magnetron sputtering in Ar+N2+O2 plasma. The magnetic and structural properties were investigated as a function of the flow rates of the O2 and N2 introduced into the argon atmosphere. A high Bs (19 kG) and soft magnetic properties (Hc¿0.3 Oe, ¿¿3000) were obtained for a wide range of O2 and N2 flow rates, and were retained after high-temperature (600°C) annealing. X-ray diffraction patterns of ¿-Fe (110) revealed that the soft magnetic films consisted of fine grains. The addition of Ta and N2 together with 02 in small amounts was highly effective for improving the soft magnetic properties and thermal stability. It decreased the post-annealing magnetic anisotropy and prevented the growth of ¿-Fe grains.
Keywords :
Annealing; Argon; Atmosphere; Magnetic anisotropy; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Plasma properties; Soft magnetic materials; Sputtering;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1991.4565288
Filename :
4565288
Link To Document :
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