• DocumentCode
    799168
  • Title

    Soft Magnetic Properties of High-Bs FeTa-N-O Films

  • Author

    Oura, H. ; Watanabe, Y. ; Onozato, N.

  • Author_Institution
    JVC.
  • Volume
    6
  • Issue
    11
  • fYear
    1991
  • Firstpage
    960
  • Lastpage
    966
  • Abstract
    Magnetic thin films of FeTa-N-O were prepared by using facing-target type dc magnetron sputtering in Ar+N2+O2 plasma. The magnetic and structural properties were investigated as a function of the flow rates of the O2 and N2 introduced into the argon atmosphere. A high Bs (19 kG) and soft magnetic properties (Hc¿0.3 Oe, ¿¿3000) were obtained for a wide range of O2 and N2 flow rates, and were retained after high-temperature (600°C) annealing. X-ray diffraction patterns of ¿-Fe (110) revealed that the soft magnetic films consisted of fine grains. The addition of Ta and N2 together with 02 in small amounts was highly effective for improving the soft magnetic properties and thermal stability. It decreased the post-annealing magnetic anisotropy and prevented the growth of ¿-Fe grains.
  • Keywords
    Annealing; Argon; Atmosphere; Magnetic anisotropy; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Plasma properties; Soft magnetic materials; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1991.4565288
  • Filename
    4565288