Title :
Magnetic Properties of Fe-X-N (X=Zr, Hf, Nb, Ta) Films
Author :
Nakanishi, K. ; Shimizu, O. ; Yoshida, S.
Author_Institution :
Fuji Photo Film Co., Ltd.
Abstract :
Fe-X-N (X=Zr, Hf, Nb, Ta) ternary system films containing ultra-fine ¿-Fe crystal grains, and whose elements X have a strong affinity for nitrogen that may form amorphous phases, were prepared by sputtering. The dependence of the soft magnetic properties on the film composition was Then investigated. Good soft magnetic properties and high saturation flux density Bs were obtained in each system. In particular, the Fe-Zr-N and Fe-Hf-N systems had a wide soft magnetic range, and films at certain compositions in these systems exhibited zero magnetostriction and high Bs values of up to 16 kG.
Keywords :
Amorphous magnetic materials; Amorphous materials; Hafnium; Magnetic films; Magnetic flux; Magnetic properties; Magnetostriction; Niobium; Nitrogen; Sputtering;
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
DOI :
10.1109/TJMJ.1992.4565344