DocumentCode :
80
Title :
Simulation Study of Quasi-Ballistic Transport in Asymmetric DG-MOSFET by Directly Solving Boltzmann Transport Equation
Author :
Gai Liu ; Gang Du ; Tiao Lu ; Xiaoyan Liu ; Pingwen Zhang ; Xing Zhang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Volume :
12
Issue :
2
fYear :
2013
fDate :
Mar-13
Firstpage :
168
Lastpage :
173
Abstract :
In this study, we simulate double-gate MOSFET using a 2-D direct Boltzmann transport equation solver. Simulation results are interpreted by quasi-ballistic theory. It is found that the relation between average carrier velocity at virtual source and back-scattering coefficient needs to be modified due to the oversimplified approximations of the original model. A 1-D potential profile model also needs to be extended to better determine the kT-layer length. The key expression for back-scattering coefficient is still valid, but a field-dependent mean free path is needed to be taken into account.
Keywords :
Boltzmann equation; MOSFET; 1D potential profile model; 2D direct Boltzmann transport equation solver; asymmetric DG-MOSFET; average carrier velocity; backscattering coefficient; double-gate MOSFET; field-dependent mean free path; kT-layer length; quasiballistic transport; virtual source; Boltzmann equation; Logic gates; Mathematical model; Scattering; Semiconductor device modeling; Simulation; Boltzmann transport equation (BTE); double-gate FETs; numerical simulation; quasi-ballistic transport;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2013.2237924
Filename :
6403553
Link To Document :
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