• DocumentCode
    801466
  • Title

    Soft Magnetic Properties of F Included Films with Metal-Metalloid Systems

  • Author

    Sugawara, E. ; Matsumoto, F. ; Fujimori, H. ; Masumoto, T.

  • Author_Institution
    Amorphous Magnetic Device Laboratory.
  • Volume
    7
  • Issue
    11
  • fYear
    1992
  • Firstpage
    872
  • Lastpage
    879
  • Abstract
    stract-Co-Fe-B-F amorphous and nano-crystalline films were prepared using a high deposition rate sputtering apparatus with two opposing targets. The chemical composition of these films could be easily varied from boron-rich/fluorine-poor to boron-poor/fluorine-rich by changing the quantity of fluorine gas. The content of the metalloid (B+F) was found to be constant in amorphous phases. Soft magnetic properties were obtained for films with high B and low F contents. These films had both a high saturated magnetization of 1.6 to 1.8 T, and a high resistivity, from 150 to 1000 ¿¿-cm. TEM observations clarified that fluorine decreases the size of mici ocrystals from 10 nm to 5 nm in CoFeBF films with low B contents. The simultaneous occurrence of high Bs and high ¿ is attributed to various factors, including the constant metalloid content of (B+F) and a fine texture of mixed phases owing to the presence of F.
  • Keywords
    Amorphous materials; Conductivity; Frequency; Iron; Magnetic devices; Magnetic films; Magnetic properties; Magnetics Society; Soft magnetic materials; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1992.4565522
  • Filename
    4565522