DocumentCode :
803059
Title :
Effects of Annealing on the Magnetic Properties of High Bs CoHfTa Materials
Author :
Arimoto, Y. ; Ohkubo, K. ; Fumoto, T. ; Yamasaki, H.
Author_Institution :
Fuji Electric Corporate R&D, Ltd.
Volume :
8
Issue :
8
fYear :
1993
Firstpage :
528
Lastpage :
536
Abstract :
We have investigated the magnetic properties of sputtered amorphous Co-Hf-Ta films in order to obtain a high saturation magnetization, low saturation magnetostriction, high crystallization temperature and high permeability. A high permeability of 4800 was obtained after annealing in a rotating magnetic field. The permeability ¿ increases with rising annealing temperature, but decreases by crystallization at higher temperatures. This increase in ¿ is dependent on the applied magnetic field, and saturates above 600 Oe. The magnetic field applied during the cooling process has a great influence on the permeability. The domain structure of amorphous Co-Hf-Ta films with a head core pattern was observed using a colloidal solution. The domain structure nearly changes into a single domain on annealing, but the domain wall perpendicular to the gap width remains at the tip even after annealing. A single domain structure was observed in multilayed Co-Hf-Ta/SiN/Co-Hf-Ta films.
Keywords :
Amorphous materials; Annealing; Crystallization; Magnetic fields; Magnetic films; Magnetic properties; Magnetostriction; Permeability; Saturation magnetization; Temperature;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1993.4565688
Filename :
4565688
Link To Document :
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