Scaling characteristics of the XeF (C→A) excimer laser

Author

Dane, Brent C. ; Hirst, Graeme J. ; Yamaguchi, Shigeru ; Hofmann, Thomas ; Wilson, William L., Jr. ; Sauerbrey, Roland ; Tittel, Frank K. ; Nighan, William L. ; Fowler, Michael C.

Author_Institution

Dept. of Electr. & Comput. Eng., Rice Univ., Houston, TX, USA

Volume

26

Issue

9

fYear

1990

fDate

9/1/1990 12:00:00 AM

Firstpage

1559

Lastpage

1568

Abstract

The scaling characteristics and medium properties of an injection-controlled XeF(C→A) laser pumped by a 10-ns-high current density electron beam have been investigated. A five-component laser gas mixture, consisting of F₂, NF₃, Xe, Kr, and Ar was optimized for the scaled laser conditions, resulting in 0.8-J output pulses at 486.8 nm, corresponding to an energy density of small-signal-gain measurements combined with kinetic modeling permitted the characteristics of the dependence of net gain on the electron-beam energy deposition and gas mixture composition, resulting in an improved understanding of XeF(C→A) laser operation

Keywords

excimer lasers; laser transitions; xenon compounds; (C→A) excimer laser; 0.8 J; 1.3 percent; 10 ns; 486.8 nm; F₂-NF₃-Xe-Kr-Ar; XeF laser; electron-beam energy deposition; energy density; five-component laser gas mixture; gas mixture composition; high current density electron beam; injection controlled lasers; kinetic modeling; net gain; scaling characteristics; small-signal-gain measurements; Argon; Current density; Electron beams; Gas lasers; Laser excitation; Laser modes; Noise measurement; Pulse measurements; Pulsed laser deposition; Pump lasers;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.102636

Filename

102636